Controllable growth of MoO3 dielectrics with sub-1 nm equivalent oxide thickness for 2D electronics

Free-standing growth of MoO3 dielectrics

The physical vapor deposition (PVD) technique was employed to grow layered MoO3 on SiO2/Si substrates (see Methods for details). From the scanning electron microscopy (SEM) images as shown in Fig. 1a, b,…

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