Basic structural characterizations and property measurement
An ultrathin 8 nm VO2 film was epitaxially grown on a TiO2 substrate to maximize the effect on the interfacial coupling. A CdS layer was subsequently deposited (about 80 nm thick),…
An ultrathin 8 nm VO2 film was epitaxially grown on a TiO2 substrate to maximize the effect on the interfacial coupling. A CdS layer was subsequently deposited (about 80 nm thick),…